Michael W. Hinds, Assay Chemist, Royal Canadian Mint, Ottawa, ON, Canada

He received his Ph.D. in Analytical Chemistry from the University of Saskatchewan (Saskatoon, Canada) in 1988. In the same year, he joined the Royal Canadian Mint as an Assay Chemist. Mike implemented many new methods using a variety of spectrometric techniques to analyse a range of precious andnon-precious metal samples. He has been developing methods using XRF spectrometry since 1999. His expertise also includes mass measurement and dimensional metrology. His duties include acting as consultant for both Ottawa and Winnipeg facilities for solving measurement problems and spectrometer purchases. He continues to be involved with the fabrication and characterization of all manner of in-house standards and reference materials for precious metal analysis.

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Robert W. Morton, Ph.D. in Analytical Chemistry

Dr. Morton has worked as an industrial chemist since 1977. He received his B.S. degree in Chemistry from Missouri Western State University (1979) and graduated with a Ph.D. in Analytical Chemistry– X-ray Spectrometry from the University of Missouri–Kansas City (1987). Dr. Morton began his career in the petroleum industry as an x-ray scientist for Phillips Petroleum Company which is today Phillips 66. He is a leading expert concerning sulfur in fuels and has numerous patents on the chemical removal of sulfur from fuel and gas streams. His instrument designs include the dual wavelength absorption edge spectrometer, the divergent beam diffractometer, and the dual wavelength ultra-low sulfur x-ray spectrometer.

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Johan Boman, Ph. D. in physics, 

In a normal Energy Dispersive X-Ray Fluorescence (EDXRF) spectrometer you get fluorescence signals not only from the sample of interest, but also from the sample support. This leads to higher detection limits for many of the elements under analysis. One way around this obstacle is to arrange the spectrometer in such a way that the incoming X-Rays are totally reflected on the sample support. This is achieved in TXRF where the incoming angle is lower than the critical angle for the energy of the X-Ray radiation and the material of the reflector. The difference between an EDXRF and a TXRF spectrum is illustrated below. 

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